The lab has a large number of photoresists, ranging from standard i-line photoresists to deep-UV chemically amplified resists and SU-8 epoxies.
Prof. Andrew Sarangan
University of Dayton
sarangan@udayton.edu
(937) 229-3190
The lab has a large number of photoresists, ranging from standard i-line photoresists to deep-UV chemically amplified resists and SU-8 epoxies.