• Logs
• Maintenance
• Documents
This is an older RIE etch tool that has been fitted to run with O2 and Ar plasma for general cleaning and plasma treatment applications
Prof. Andrew Sarangan
University of Dayton
sarangan@udayton.edu
(937) 229-3190
• Logs
• Maintenance
• Documents
This is an older RIE etch tool that has been fitted to run with O2 and Ar plasma for general cleaning and plasma treatment applications