![](https://nano-fab.com/wp-content/uploads/sites/7/2018/05/edc650-e1525472443812.jpg)
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Photoresist development is done in a spray-puddle developer. This produces more consistent and repeatable results compared to dish development.
Photonics, Electronics, Optical Coatings
Prof. Andrew Sarangan
University of Dayton
sarangan@udayton.edu
(937) 229-3190
• Logs
• Maintenance
• Documents
Photoresist development is done in a spray-puddle developer. This produces more consistent and repeatable results compared to dish development.