Photoresist films are spin coated in this standard spin coating tool. The substrate is held by vacuum, and the chamber is purged with nitrogen.
Photonics, Electronics, Optical Coatings
Prof. Andrew Sarangan
University of Dayton
sarangan@udayton.edu
(937) 229-3190
Photoresist films are spin coated in this standard spin coating tool. The substrate is held by vacuum, and the chamber is purged with nitrogen.