Semiconductor Device Fabrication Lab

Photonics, Electronics, Optical Coatings

Prof. Andrew Sarangan
University of Dayton
(937) 229-3190

SSI Solaris 100 Rapid Thermal Processor

Rapid thermal annealing is used to activate implanted dopants in semiconductors. It applies a short heat pulse that reduces the thermal diffusion of doped species. The temperature can be ramped up to 1200C within 15 seconds, and ramped down within 60 seconds.